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On the approach to the analysis of the growth of epitaxial layers by pulsed laser deposition

creativeworkseries.issn2720-4081
dc.contributor.authorPankratov, Evgenij Leonidovič
dc.date.available2025-03-28T09:45:06Z
dc.date.issued2021
dc.descriptionBibliogr. s. 207.
dc.description.abstractThis paper considers an analytical approach for the prognosis of mass and heat transport during the growth of epitaxial layers by means of pulsed laser deposition. The approach provides the opportunity to make a prognosis which takes into account the spatial and temporal variations of their parameters and, at the same time, the nonlinearity of these processes. Based on this approach, the influence of the variation of several parameters on the growth process is investigated.en
dc.description.placeOfPublicationKraków
dc.description.versionwersja wydawnicza
dc.identifier.doihttps://doi.org/10.7494/cmms.2021.4.0768
dc.identifier.eissn2720-3948
dc.identifier.issn2720-4081
dc.identifier.urihttps://repo.agh.edu.pl/handle/AGH/111709
dc.language.isoeng
dc.publisherWydawnictwa AGH
dc.relation.ispartofComputer Methods in Materials Science
dc.rightsAttribution 4.0 International
dc.rights.accessotwarty dostęp
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/legalcode
dc.subjectpulsed laser depositionen
dc.subjectmass and heat transporten
dc.subjectanalytical modellingen
dc.titleOn the approach to the analysis of the growth of epitaxial layers by pulsed laser depositionen
dc.title.relatedComputer Methods in Materials Scienceen
dc.typeartykuł
dspace.entity.typePublication
publicationissue.issueNumberNo. 4
publicationissue.paginationpp. 203-206, [2]
publicationvolume.volumeNumberVol. 21
relation.isJournalIssueOfPublication3661968d-4cb7-4bc3-9471-218a94fbd3b9
relation.isJournalIssueOfPublication.latestForDiscovery3661968d-4cb7-4bc3-9471-218a94fbd3b9
relation.isJournalOfPublication1f717eff-e164-4db5-8437-ca75e714cac5

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